High Purity Target Manufacturing Methods
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United States of America Patent
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Issued Date -
Oct 18, 2007
app pub date -
Jun 1, 2005
filing date -
Jun 15, 2004
priority date (Note) -
Abandoned
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Abstract
A method for producing a high purity tungsten sputtering target. The method includes heat treating of high purity tungsten powder in order to consolidate it into a blank with density providing closed porosity. The consolidation may be achieved by hot pressing, HIP or any other appropriate method. Next, this plate is rolled to produce target blanks of approximate size and further increased density of the material. The method may be applicable to a variety of blanks including round shape target blanks, for example, consisting of tungsten, molybdenum, tantalum, hafnium, etc.
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