Hybrid plasma reactor
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United States of America Patent
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Issued Date -
Sep 27, 2007
app pub date -
Mar 16, 2007
filing date -
Mar 21, 2006
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
Provided is a hybrid plasma reactor. The hybrid plasma reactor includes an ICP (Inductively Coupled Plasma) source unit and a bias RF (Radio Frequency) power supply unit. The ICP source unit includes a chamber, an antenna coil unit, and a source power supply unit. The chamber includes a chamber body whose top is opened and a dielectric window covering the opened top of the chamber body. The antenna coil unit is disposed outside of the dielectric window. The source power supply unit supplies a source power to the antenna coil unit. The bias RF power supply unit supplies a bias RF power to a cathode. The cathode is installed within the chamber and mounts a target wafer on its top.
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