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• 15 United States
• 10 France
• 8 Japan
• 7 China
• 5 Korea
• 2 Other

Patent Owner(s)

Patent Owner	Address
JNC CORPORATION	2-1 OTEMACHI 2-CHOME CHIYODA-KU TOKYO 1008105 ?1008105

International Classification(s)

• C08G:MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN B....

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Kondo, Fumitaka	Chiba, JP	37	256
# of filed Patents : 37 Total Citations : 256
Ootaniuchi, Yuuko	Chiba, JP	1	1
# of filed Patents : 1 Total Citations : 1

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Patent Citation Ranking

• 1 Citation Count
• C08G Class

• 10.62 % this patent is cited more than
• 18 Age

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Maintenance Fees

Fee	Large entity fee	small entity fee	micro entity fee	due date

Fee	Large entity fee	small entity fee	micro entity fee
Surcharge after expiration - Late payment is unavoidable	$700.00	$350.00	$175.00
Surcharge after expiration - Late payment is unintentional	$1,640.00	$820.00	$410.00

Full Text

US Patent Application No: 2007/0213,502

Composition for forming insulating layer and insulating film

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Abstract

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Such a composition for forming an insulating layer improved in insulating property is to be obtained. A composition for forming an insulating layer of an electronic device is provided, and the composition contains at least one polymer selected from a polyamic acid and a derivative of a polyamic acid, and a compound having a functional group capable of reacting with a carboxyl group contained in a constitutional unit of the polymer.

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Description

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