Positive Photosensitive Composition
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United States of America Patent
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N/A
Issued Date -
Sep 13, 2007
app pub date -
Jul 12, 2005
filing date -
Aug 2, 2004
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
There is provided a positive photosensitive composition which requires no burning, makes it possible to obtain necessary and sufficient adhesion when it is applied under a humidity of 25 to 60%, is excellent in stability on standing and reproducibility, can be developed at a low alkali intensity, makes it possible to carry out development with keeping high sensitivity while forming no residue, ensures sharp edges, can provide a very hard resist film and is improved in scratch resistance in the handling before development. The positive photosensitive composition comprises, as essential components, (A) a high molecular substance having at least one carboxyl group and/or at least one acid anhydride group in a molecule thereof, (B) an amine compound, and (C) a photo-thermal conversion material that absorbs infrared rays from an image exposure light source to convert the rays to heat.
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