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Abstract

A lithographic method, products obtained thereby and use of the method, in particular, in the production of micro- or nano-metric products or objects. The method includes the steps of deposition of a film of an organometallic solution of a substrate, containing at least one metal ion as precursor(s) for marking the substrate, local exposure, according to the required pattern, of the obtained film, via at least one focussed energetic beam, with an energy density sufficient to at least locally dry the film, dissolution of the non-exposed zone, the at least dried zones remaining on the substrate, optionally subjecting the obtained product to a thermal treatment and, where necessary, repetition of certain steps, with optional change to the organometallic solution, until the required final product is obtained.

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