Tungsten Plug Corrosion Prevention Method Using Water
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United States of America Patent
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app pub date -
May 4, 2007
filing date -
Jun 24, 2003
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Abandoned
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Abstract
Disclosed herein is a method of making integrated circuits. In one embodiment the method includes forming tungsten plugs in the integrated circuit and forming electrically conductive interconnect lines in the integrated circuit after formation of the tungsten plugs. At least one tungsten plug is electrically connected to at least one electrically conductive interconnect line. Thereafter at least one electrically conductive interconnect line is contacted with water for a period of time less than 120 minutes.
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