Micro-pattern forming apparatus, micro-pattern structure, and method of manufacturing the same
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United States of America Patent
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Issued Date -
Aug 30, 2007
app pub date -
Aug 30, 2006
filing date -
Feb 28, 2006
priority date (Note) -
Abandoned
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Abstract
There is provided a micro-pattern forming apparatus including an electrospraying part for applying a voltage to a solution containing a sample to electrostatically atomizing the solution; a supporting part (30) for supporting a chip (26), on which the sample in the solution electrostatically atomized by the electrospraying part, is to be deposited; and a fine mask part (24) disposed between the electrospraying part and the supporting part, having a mask pattern for being passed through by the electrostatically atomized solution in order to form a micro-pattern of the sample upon the chip, wherein the mask pattern is made from a photoresist material with concavity and convexity on the side of the supporting part.
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