Plasma generating method, plasma generating apparatus, and plasma processing apparatus
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United States of America Patent
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Issued Date -
Aug 23, 2007
app pub date -
Feb 20, 2007
filing date -
Feb 20, 2006
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
One or more high-frequency antennas is allocated to and disposed in one cubic space C having a side of 0.4 [m] in a plasma generating chamber 1 or in each of plural cubic spaces C, each having a side of 0.4 [m], adjacent ones of the plural cubic spaces being continuous to each other without forming a gap therebetween. The total length L [m] of the high-frequency antennas in each of the cubic spaces C is set in a range which satisfies relationships of (0.2/P)
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