Lithographic printing plates with high print run stability
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United States of America Patent
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Issued Date -
Aug 9, 2007
app pub date -
Jul 14, 2005
filing date -
Jul 16, 2004
priority date (Note) -
Abandoned
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Abstract
Radiation-sensitive element comprising (a) an optionally pretreated substrate and (b) a radiation-sensitive coating consisting of a composition comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a freeradical polymerization, (ii) at least one radiation-sensitive initiator or initiator system for free-radical polymerization absorbing radiation selected from the wavelength range of 300 to 1,200 nm; and (iii) at least one silsesquioxane comprising at least one substituent with at least one ethylenically unsaturated group each; applied onto the substrate.
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