Pattern inspection apparatus and method and workpiece tested thereby
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Jul 19, 2007
app pub date -
Mar 20, 2006
filing date -
Jan 19, 2006
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A pattern inspection apparatus capable of finding temporary emphatic portions in the process of transfer-and-development simulation of the image of a workpiece being tested is disclosed. This apparatus includes a first storage unit for retaining therein the pattern of an image captured from a workpiece under testing, a simulator for applying transfer/development simulation to the captured image pattern, and a second storage unit for storing the pattern of an image which is being presently simulated during the transfer/development simulation of the originally captured image pattern. A comparison processor handles as a pattern to be tested a pattern of the presently simulated or 'midstream' image of the captured image while using a pattern to be compared as a fiducial pattern and compares the to-be-tested image to the fiducial pattern. A pattern inspection method is also disclosed.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully