Etch chamber
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United States of America Patent
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N/A
Issued Date -
Jul 19, 2007
app pub date -
Jan 18, 2006
filing date -
Jan 18, 2006
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
An etch chamber and a method of reducing back flow of particles in an etch chamber having a valve connected thereto. The etch chamber comprises a valve connected to the etch chamber; and a liner a liner disposed to cover an internal gap between a flange portion of the valve and a flange portion of the etch chamber.
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