Pattern inspection apparatus and method along with workpiece tested thereby and management method of workpiece under testing
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United States of America Patent
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Issued Date -
Jun 28, 2007
app pub date -
Mar 20, 2006
filing date -
Dec 27, 2005
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A pattern inspection apparatus for inspecting deterioration of the optical image of a workpiece to be tested is disclosed. The apparatus includes an image acquisition unit operable to capture an optical image of a workpiece under testing, a first memory for storing therein the workpiece image as a fiducial or 'base' image, a second memory for receiving after acquisition of the base image another workpiece image gained by the image acquisition unit and for storing it as an image to be tested, and a comparison processor unit for comparing the test image to the base image. The workpiece base image that was read out of the first memory is compared to the test image of the workpiece as read from the second memory. A pattern inspection method and a workpiece obtained thereby along with a workpiece management methodology are also disclosed.
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