Plasma producing method and apparatus as well as plasma processing apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
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N/A
Issued Date -
Jun 28, 2007
app pub date -
Oct 26, 2006
filing date -
Oct 27, 2005
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
Plasma producing method and apparatus as well as plasma processing apparatus including the plasma producing apparatus wherein one or more high-frequency antennas are arranged in a plasma producing chamber, and a high-frequency power is applied to a gas in the chamber from the antenna(s) to produce inductively coupled plasma. Impedance of the high-frequency antenna is set in a range of 45 .OMEGA. or lower.
First Claim
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| Country | kind | publication No. | Filing Date |
|---|---|---|---|
| JP | A | JP2007149638 | Jun 29, 2006 |
| TW | B | TWI324026 | Oct 18, 2006 |
| KR | A | KR20070045957 | Oct 26, 2006 |
International Classification(s)
- 2006 Application Filing Year
- C23C Class
- 1166 Applications Filed
- 600 Patents Issued To-Date
- 51.46 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 3 Citation Count
- C23C Class
- 3.52 % this patent is cited more than
- 18 Age