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United States of America Patent

SERIAL NO

11668477

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Abstract

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A NVM including a substrate, a control gate layer, a charge storage layer, a tunneling layer, a charge barrier layer, a gate dielectric layer and a first doping region is described. The control gate layer is disposed in a first trench of the substrate; the charge storage layer is disposed between the sidewall of the first trench and the control gate layer; the tunneling layer is disposed between the sidewall of the first trench and the charge storage layer; the charge barrier layer is disposed between the charge storage layer and the control gate layer; the gate dielectric layer is disposed between the bottom of the first trench and the control gate layer; and the first doping region is disposed in the substrate at one side of the control gate layer.

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Patent Owner(s)

Patent OwnerAddress
CHANG LIAO HOLDINGS LLC2711 CENTERVILLE ROAD SUITE 400 WILMINGTON DE 19808

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Wang, Ting-Sing Hsinchu Hsien, TW 12 93

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