Apparatus and methods for slurry cleaning of etch chambers
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United States of America Patent
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Issued Date -
May 17, 2007
app pub date -
Nov 14, 2005
filing date -
Nov 14, 2005
priority date (Note) -
Abandoned
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Abstract
Described are methods of cleaning debris from semiconductor etch chambers or chamber components, one method comprising directing atomized abrasive slurry onto at least some internal surfaces of such a chamber or chamber components. Apparatus for carrying out the methods are also described.
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