LIGHT REFLECTIVE STRUCTURE, METHOD FOR PRODUCING THE SAME AND DISPLAY

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United States of America Patent

SERIAL NO

11620349

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Abstract

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In order to fabricate a light reflective structure for a liquid crystal display, a photosensitive resin layer is formed with use of a thermosetting photosensitive resin, the photosensitive resin layer is exposed through a photomask having a particular pattern by a proximity method, the exposed photosensitive resin layer is developed to form an insolubilized resin layer, and the insolubilized resin layer is subjected to a heat treatment to have surface smoothness improved and to accelerate setting of the resin layer.

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Patent Owner(s)

Patent OwnerAddress
OPTREX CORPORATION5-7-18 HIGASHINIPPORI ARAKAWA-KU TOKYO 116-0014

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fukuoka, Kenichi Hyogo, JP 98 7305
Mori, Haruki Hyogo, JP 96 854
Okuda, Takahiro Hyogo, JP 25 114
Ozeki, Masao Kanagawa, JP 40 744
Takasaki, Ichiro Hiroshima, JP 11 29

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