System for manufacturing a fullerene derivative and method for manufacturing
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
May 17, 2007
app pub date -
Dec 3, 2004
filing date -
Dec 3, 2003
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
Provided is a system for manufacturing a fullerene derivative whereby it is possible to heat electrons in a plasma highly efficiently and to attain the improved yield of a fullerene derivative. The system can generate a high electron temperature plasma using plasma generating elements including a microwave generator, mirror field generating coil, and four phased helical antenna. Thus, with this system, the production efficiency of the ions of an atom which acts as a moiety in the production of a fullerene derivative is improved, and the yield of a fullerene derivative is also improved.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully