Method and apparatus for control of layer thicknesses
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United States of America Patent
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Issued Date -
May 10, 2007
app pub date -
Nov 8, 2005
filing date -
Nov 8, 2005
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Abandoned
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Abstract
It is shown a method and apparatus for distributing a viscous liquid over a surface of a substrate with high homogeneity in a defined area, e. g. on a semiconductor wafer or a data storage media, by conditioning the liquid on the substrate thermally in a first step and exposing it to UV radiation in two further steps, locally specific before or during the spin coating process.
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