Method for producing fluorene derivative

Number of patents in Portfolio can not be more than 2000

United States of America Patent

APP PUB NO 20070100170A1
SERIAL NO

10501890

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

Fluorenone and a phenolic compound (e.g., a 2-C.sub.1-4alkylphenol) is subjected to a condensation reaction in coexistence with a thiol compound and a hydrochloric acid aqueous solution to produce a fluorene derivative [e.g., 9,9-bis(C.sub.1-4alkylhydroxyphenyl)fluorene]. The proportion (weight ratio) of fluorenone relative to the thiol compound [fluorenone/the thiol compound] is about 1/0.01 to 1/0.5, and the proportion (weight ratio) of the thiol compound relative to hydrochloric acid (HCl) in the hydrochloric acid aqueous solution [the thiol compound/hydrochloric acid] is about 1/0.1 to 1/3. As the thiol compound, a mercaptocarboxylic acid (.beta.-mercaptopropionic acid) may be used. According to the method, a highly purified fluorene derivative excellent in transparency can be obtained inexpensively and simply without using a hydrogen chloride gas having handling difficulty.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
OSAKA GAS COMPANY LIMITED1-2 HIRANOMACHI 4-CHOME CHUO-KU OSAKA-SHI OSAKA

International Classification(s)

  • [Classification Symbol]
  • [Patents Count]

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Murase, Hiroaki Osaka-shi, JP 19 152
Ogata, Kazuyuki Osaka-shi, JP 4 60
Suda, Yasuhiro Osaka-shi, JP 11 100
Yamada, Mitsuaki Osaka-shi, JP 6 50

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation