Porous chalcogenide thin film, method for preparing the same and electronic device using the same
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United States of America Patent
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Issued Date -
Apr 26, 2007
app pub date -
May 23, 2006
filing date -
Oct 24, 2005
priority date (Note) -
Abandoned
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Abstract
A porous chalcogenide thin film having a microporous structure, a method for preparing the chalcogenide thin film and an electronic device employing the chalcogenide thin film, are provided. The porous chalcogenide thin film has superior crystallinity and can be applied as a semiconductor layer having superior electrical properties to the fabrication of devices by inserting functional metal or semiconductor nanoparticles into nanopores of the thin film.
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