Devices, systems and methods for determining temperature and/or optical characteristics of a substrate
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United States of America Patent
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Issued Date -
Apr 5, 2007
app pub date -
Sep 30, 2005
filing date -
Sep 30, 2005
priority date (Note) -
Abandoned
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Abstract
A system for measuring the true temperature of a substrate in a deposition system is disclosed. The temperature measurement system has at least one opening formed within a showerhead or manifold placed above a substrate of the deposition system. The temperature measurement system includes an optical pyrometer and reflectometer external to the coating chamber that looks through a window or windows and through the at least one opening in the showerhead to sense the substrate being coated. Depending on the particular chamber and showerhead configuration, the system either makes a passive emissivity correction or has an integral reflectometer for an active emissivity correction. Optical features confer an insensitivity to small motions of the showerhead in large coaters where optical alignment is not assured due to thermal and mechanical influences.
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