Novel tetraoxaspiroalkanes and methods of use with organosilicon monomers in polyerizable compositions
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United States of America Patent
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Issued Date -
Mar 29, 2007
app pub date -
Sep 29, 2006
filing date -
Sep 29, 2005
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Abstract
This invention relates to compositions of matter that include a polymerization stress reducing monomer, which may be one of the novel tetraoxaspiroalkanes disclosed herein, and an organosilicon monomer, such as a silorane. These matrix resin compositions may also include a photoinitiator, a photosensitizer, a reaction promoter, and other additives. The photopolymerizable compositions of this invention are useful for a variety of applications including use as dental matrix resin systems, such as restorative composites.
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