Deep ultraviolet laser apparatus
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United States of America Patent
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Issued Date -
Mar 22, 2007
app pub date -
Sep 19, 2006
filing date -
Sep 20, 2005
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
The present invention provides a deep ultraviolet laser apparatus exhibiting high robustness which can generate laser beams in a wavelength region of wavelengths of from 198.3 to 198.8 nm, further may be loaded on a variety of apparatuses as a light source for lighting, and is practicable and a size of the whole structure of thereof is reduced. The deep ultraviolet laser apparatus is arranged in such that laser beams having a wavelength of from 1064 to 1065 nm pulse-output from a first light source is a first fundamental wave; fourth harmonic obtained by wavelength-converting the first fundamental wave by means of a first wave-length conversion means is a second fundamental wave; laser beams having a wavelength of from 1560 to 1570 nm pulse-output from a second light source is a third fundamental wave; second harmonic obtained by wavelength-converting the third fundamental wave by means of a second wave-length conversion means is a fourth fundamental wave; and laser beams having a wavelength of from 198.3 to 198.8 nm which are a sum-frequency light of the second fundamental wave and the fourth fundamental wave are generated by means of a sum-frequency wave generation means.
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