Lighting system and exposure apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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N/A
Issued Date -
Mar 15, 2007
app pub date -
Aug 15, 2006
filing date -
Sep 12, 2005
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A lighting system and an exposure apparatus in which even if the outgoing optical axes of outgoing beams emitted from a plurality of LDs disposed on a flat plane are shifted, the efficiency of use of the beams can be improved, and the directivity of lighting can be enhanced. Diffused beams output from a plurality of LDs arrayed two-dimensionally are converted into high-directivity beams with spread angles equalized circumferentially by two kinds of cylindrical lenses. In this event, the optical axis of the beam emitted from each LD may tilt due to misalignment of the center of the beam with the optical axes of the corresponding cylindrical lenses. This tilt is corrected by a wedged glass. Thus, the optical axis of the beam output from each LD meets the optical axis in the entrance plane of an integrator.
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