Pattern inspection apparatus and method and reticle for use therein
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United States of America Patent
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Issued Date -
Mar 8, 2007
app pub date -
Dec 16, 2005
filing date -
Sep 7, 2005
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A method and apparatus for performing appropriate inspection by selecting a pattern comparison technique in accordance with the pattern feature of an object being tested are disclosed. The pattern inspection apparatus includes an optical image acquisition unit which acquires an optical image of the test object. A plurality of types of feature comparator units are provided for comparing identical patterns at different positions on the test object based on feature data indicating pattern features of the test object. During comparison of the identical patterns of the optical image, a selector unit selects an adequate kind of feature comparator from the pattern feature data of the test object.
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