Reference image forming apparatus, pattern inspection apparatus, and reference image forming method, and reticle

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United States of America Patent

APP PUB NO 20070052960A1
SERIAL NO

11298720

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Abstract

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A method and apparatus for forming an appropriate reference image in inspection of a pattern of an object to be inspected depending on characteristics of the pattern are disclosed. A reference image forming apparatus includes an optical image acquisition unit which acquires an optical image of an object to be inspected, a conversion parameter determining unit which uses feature data based on the characteristic of the pattern of the image of the object to be inspected to calculate a conversion parameter from the optical image and design data of the object to be inspected, and a reference image creation unit which performs arithmetic processing to the conversion parameter and the design data to form a reference image.

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Patent Owner(s)

Patent OwnerAddress
ADVANCED MASK INSPECTION TECHNOLOGY INC8 SHINSUGITA-CHO ISOGO-KU YOKOHAMA-SHI KANAGAWA 235-0032

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Harabe, Nobuyuki Kanagawa, JP 5 15

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