High fill-factor bulk silicon mirrors with reduced effect of mirror edge diffraction
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United States of America Patent
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app pub date -
Jul 20, 2006
filing date -
Jun 2, 2001
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Abandoned
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Abstract
A method and apparatus for fabricating a MEMS apparatus having a device layer with an optical surface that is supported by a pedestal on a planar support layer that is suspended for movement with respect to a base support by hinge elements disposed in a different plane from the planar support layer. The surface area of the optical surface is maximized with respect to the base support to optimize the fill factor of the optical surface and afford a high passband. The height of the pedestal is selected to position the device layer sufficiently above the base support to afford an unobstructed predetermined angular rotation about each axis. The hinges may be made of thin-film material, fabricated by way of surface micromachining techniques. The hinges are disposed underneath the device layer enabling the optical surface to be maximized so that the entire surface becomes usable (e.g., for optical beam manipulation). The optical surfaces of the devices further include one or more edges that are configured to reduce the effects of diffraction of light incident near the edges.
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