UV disinfection systems with tangential inlets and methods thereof
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United States of America Patent
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Issued Date -
Mar 1, 2007
app pub date -
Jun 30, 2006
filing date -
Jul 6, 2005
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A disinfection system and method includes a reactor with a chamber and at least one radiation source. The chamber in the reactor has at least one inlet that is oriented to generate a vortex motion for a fluid introduced to the chamber. The radiation source is positioned to be offset from an axis which extends along a center of the chamber of the reactor. The radiation source at least partially directs radiation towards a circulating flow of the fluid in the chamber from the vortex motion in at least a gap between a wall of the chamber of the reactor and the at least one radiation source.
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