Materials and reactor systems having humidity and gas control
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United States of America Patent
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app pub date -
Oct 20, 2006
filing date -
Apr 10, 2001
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Abandoned
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Abstract
The present invention is directed to materials and reactor systems having humidity and/or gas control. The material may have high oxygen permeability and/or low water vapor permeability. In some cases, the material may have sufficient permeance and/or permeability to allow cell culture to occur in a chip or other reactor system using the material. In certain embodiments, the material may be positioned adjacent to or abut a reaction site within a chip or reactor; in other embodiments, the material may be positioned such that it is in fluidic communication with the reaction site. The material may also be porous and/or transparent in some cases. In one set of embodiments, the material include a polymer that is branched, and/or contains bulky side groups that allow the polymer to have a more open structure. In some cases, the material may include two or more layers. Each layer may have a desired property, which may include, for example, permeability, transparency, cytophilicity, biophilicity, hydrophilicity, or a structural feature. In some embodiments, the material may be chosen so as to promote cell growth within the chip or reactor.
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