Vacuum chamber inlet device

Number of patents in Portfolio can not be more than 2000

United States of America Patent

APP PUB NO 20070023095A1
SERIAL NO

11448568

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Abstract

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A vacuum chamber inlet device includes a gas providing element (10), a plurality of flow control element (20), and a plurality of gas input elements (30). The gas providing element has an inlet (11) and a plurality of outlets (12). The flow control elements are connected to the outlets of the gas input element. Each of the gas input elements has a first end (31) and a second end (32). The first end is connected to the flow control elements, and the second end is disposed in the vacuum chamber. A gas vent (33) is formed on the second end.

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Patent Owner(s)

Patent OwnerAddress
SUTECH TRADING LIMITEDP O BOX 957 OFFSHORE INCORPORATIONS CENTRE ROAD TOWN TORTOLA
SHENZHEN FUTAIHONG PRECISION INDUSTRIAL CO LTDF3 SECTION-A BUILDING FOXCONN TECHNOLOGY INDUSTRY ZONE LONGHUA TOWN BAOAN DISTRICT SHENZHEN CITY GUANGDONG PROVINCE 518109

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Li, Yong-Ming Shenzhen, CN 3 1
Lin, Chih-Pen Tu-Cheng, TW 19 57
Zhang, Yi-Lin Shenzhen, CN 6 110

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