Crystallization mask, crystallization method, and method of manufacturing thin film transistor including crystallized semiconductor
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United States of America Patent
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Apr 6, 2010
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app pub date -
Sep 19, 2006
filing date -
Nov 19, 2003
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Abstract
A crystallization mask for laser illumination for converting amorphous silicon into polysilicon is provided, which includes: a plurality of transmissive areas having a plurality of first slits for adjusting energy of the laser illumination passing through the mask; and an opaque area.
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