Cr-capped chromeless phase lithography
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jun 8, 2010
Grant Date -
Jan 18, 2007
app pub date -
Jul 14, 2005
filing date -
Jul 14, 2005
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A photolithographic mask is adapted for use in imparting a pattern to a substrate. The pattern comprises a plurality of features. At least one of the plurality of features (201) is implemented in the mask as a phase shifting structure (205) with a unitary layer of opaque material (207) disposed thereon. The mask is utilized to impart the pattern to a layer over a semiconductor substrate.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully