Polyamic acid resin composition modified with laminate nanometer silica sheet and polyimide prepared therefrom

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United States of America Patent

APP PUB NO 20070009751A1
SERIAL NO

11262788

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Abstract

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The present invention relates to a polyamic acid resin composition, which is characterized by containing nanolayer silica sheet and/or nanometer silica powder. The present invention also relates to a polyimide film prepared from the composition, the resultant film exhibits improved dimension stability, low water-absorbability, high transparency, and low Coefficient of Thermal Expansion (CTE) value and is suitable used in flexible print wiring board and wiring board for liquid crystal display (LCD).

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Patent Owner(s)

Patent OwnerAddress
CHANG CHUN PLASTICS CO LTD7 FL NO 301 SONGKIANG ROAD TAIPEI

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Huang, Yu-Lin Hsinchu Industrial District, TW 29 178
Hwang, Kuen-Yuan Hsinchu Industrial District, TW 53 161
Tu, An-Pang Hsinchu Industrial District, TW 55 152
Wu, Sheng-Yen Hsinchu Industrial District, TW 11 56

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