Refrigerant mixtures used in the lower temperature stage of two-stage cascade refrigeration systems
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United States of America Patent
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Issued Date -
Jan 11, 2007
app pub date -
Jul 7, 2006
filing date -
Jul 8, 2005
priority date (Note) -
Abandoned
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Abstract
Refrigerant mixtures used in the lower temperature stage of two-stage cascade refrigeration systems and obtained by physical mixing of ethane, hexafluoroethane, or/and trifluoromethane. One of the refrigerant mixtures comprises ethane and hexafluoroethane. Another refrigerant mixture comprises ethane and trifluoromethane. Yet another one of the refrigerant mixtures comprises ethane, hexafluoroethane, and trifluoromethane.
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