Switchable reflector wall concept
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United States of America Patent
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Issued Date -
Dec 28, 2006
app pub date -
May 26, 2006
filing date -
Jun 1, 2005
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A method and apparatus for heating substrates, such as semiconductor wafers is disclosed. In accordance with the present disclosure, a thermal processing chamber includes at least one reflector. The reflector has a reflectivity that changes in response to either temperature, intensity of electromagnetic radiation incident on the reflector, or spectrum of electromagnetic radiation incident on the reflector. In this manner, the reflectivity of the reflector can be controlled during thermal processing. In this manner, the temperature of the substrate being heated can be controlled or otherwise altered.
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