Photomask and method for conveying information associated with a photomask substrate
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United States of America Patent
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app pub date -
Aug 7, 2006
filing date -
Feb 17, 2004
priority date (Note) -
Abandoned
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Abstract
A method for conveying information about a photomask substrate is disclosed. The method includes heating an area of a photomask substrate located between a top surface and a bottom surface of the photomask substrate with a laser. The heat applied to the area of the substrate forms a mark inside the substrate that stores information identifying the photomask substrate.
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