Method for analysis of objects in microlithography
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United States of America Patent
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Issued Date -
Nov 30, 2006
app pub date -
Jul 3, 2004
filing date -
Jul 11, 2003
priority date (Note) -
Abandoned
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Abstract
A method for analysis of an object in microlithography. The steps of the method include providing an aerial image measurement system (AIMS) that consists of at least two imaging steps; detecting the image output of the AIMS; and employing a correction filter to correct the detected image with respect to the transfer behavior of the second or other imaging steps. An AIMS apparatus to carry out the method is also defined.
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