Field effect transistor structures

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United States of America Patent

SERIAL NO

11455333

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Abstract

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An embodiment of the present invention provides a structure comprising a field effect transistor (FET) comprising: at least one source rail with at least one source finger; at least one drain rail with at least one drain finger; and at least one serpentine gate having a plurality of gate fingers, said serpentine gate serpentining between said at least one source finger and said at least one drain finger; and at least one feedforward capacitor symmetrically coupled with said FET via at least one gate rail.

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Patent Owner(s)

Patent OwnerAddress
PARATEK MICROWAVE INC22 TECHNOLOGY WAY MILLYARD TECHNOLOGY PARK NASHUA NH 03060

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Oakes, James Sudbury, MA 15 163
Pelliccia, Vincent Londonderry, NH 2 8

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