Laser x-ray source apparatus and target used therefore

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United States of America Patent

APP PUB NO 20060233309A1
SERIAL NO

11106081

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Abstract

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The invention teaches a x-ray source apparatus (50) with a continuous target (10). The continuous target (10) is hit on a first side (60) of the continuous target (10) by a photon beam (30) from a photon source (20). X-rays (80) are emitted from the continuous target (10). The emitted x-rays (80) are extracted from the x-ray source apparatus (50) from a second side (70) of the continuous target (10). The first side (60) of the continuous target (10) and the second side (70) of the continuous target (10) are opposite sides of the continuous target (10). The used continuous target (10) comprises nano particles.

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Patent Owner(s)

Patent OwnerAddress
WESTFAELISCHE WILHELMS UNIVERSITAET MUENSTERSCHLOSSPLATZ 2 MUENSTER 48149

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kutzner, Joerg Havixbeck, DE 1 11
Tsilimis, Grigorios Muenster, DE 2 12
Zacharias, Helmut Havixbeck, DE 5 19

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