Uniform broad ion beam deposition
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United States of America Patent
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Issued Date -
Oct 19, 2006
app pub date -
May 29, 2002
filing date -
Jun 1, 2001
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
Apparatus for the generation of a plurality of ion beams for use in vacuum sputtering methods is disclosed comprising: a discharge chamber, defined by a plasma confinement vessel, for generation of a plasma therein; and a plurality of facets located on the discharge chamber, each facet comprising acceleration and extraction means for extracting ions from the plasma in the discharge chamber in an ion beam.
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