Imprint lithography
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jul 27, 2010
Grant Date -
Oct 19, 2006
app pub date -
Apr 19, 2005
filing date -
Apr 19, 2005
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
An imprint template configured to imprint an imprintable medium by an imprint lithography process is disclosed, the imprint template having a pattern with a pattern density corresponding to a volume of imprintable medium used to substantially fill pattern features per unit area of a contact face of the imprint template, wherein adjacent regions of the pattern on the imprint template contact face, each of which will provide different functionality once imprinted onto a substrate, have substantially the same pattern density, have differences in pattern density which are minimized, or differences in pattern density which are maintained below a maximum.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully