Pattern defect inspection method and apparatus using image correction technique
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United States of America Patent
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Issued Date -
Oct 5, 2006
app pub date -
Mar 23, 2006
filing date -
Mar 29, 2005
priority date (Note) -
Abandoned
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Abstract
An image correction method employable in a pattern inspection method for emitting light falling onto a workpiece with a pattern formed thereon and for inspecting a pattern image resulting from the pickup of an optical image of the workpiece by comparing it to a corresponding fiducial pattern image is disclosed. The method includes the step of generating a system of equations describing therein an input/output relation using a 2D linear prediction model(s) with respect to the pattern image being tested and the fiducial pattern image. Then, estimate the equation system by least-squares methods to thereby obtain a parameter of the equation system. Next obtain a centroid of the parameter. Then perform interpolation using the value of the centroid, thereby to generate a corrected image. A pattern defect inspection method using the image correction method is also disclosed.
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