Methods and systems for processing a device, methods and systems for modeling same and the device

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United States of America Patent

SERIAL NO

11441763

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Abstract

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A method and system for locally processing a predetermined microstructure formed on a substrate without causing undesirable changes in electrical or physical characteristics of the substrate or other structures formed on the substrate are provided. The method includes providing information based on a model of laser pulse interactions with the predetermined microstructure, the substrate and the other structures. At least one characteristic of at least one pulse is determined based on the information. A pulsed laser beam is generated including the at least one pulse. The method further includes irradiating the at least one pulse having the at least one determined characteristic into a spot on the predetermined microstructure. The at least one determined characteristic and other characteristics of the at least one pulse are sufficient to locally process the predetermined microstructure without causing the undesirable changes.

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Patent Owner(s)

Patent OwnerAddress
GSI LUMONICS CORPORATIONNOVI MI 48375

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cordingley, James J Littleton, MA 40 1672
Ehrmann, Jonathan S Sudbury, MA 73 2375
Griffiths, Joseph J Winthrop, MA 15 388
Lee, Joohan Andover, MA 22 820
Smart, Donald V Boston, MA 52 2598
Svetkoff, Donald J Ann Arbor, MI 57 2996

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