Method for producing article having been subjected to low reflection treatment, solution for forming low reflection layer and article having been subjected to low reflection treatment

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United States of America Patent

APP PUB NO 20060204655A1
SERIAL NO

10544472

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Abstract

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A low reflection treated article manufacturing method wherein a low reflection layer solution, obtained by mixing and reacting (1) silica microparticles, comprising at least one type of silica microparticles selected from the group consisting of non-aggregated silica microparticles with an average particle diameter of 40 to 1000 nm, hollow non-aggregated silica microparticles with an average particle diameter of 10 to 100 nm, and chain-like aggregated silica microparticles with an average primary particle diameter of 10 to 100 nm, (2) a hydrolyzable silicon compound, water, and a binder solution, containing a solvent and a hydrolysis catalyst for the above-mentioned silicon compound, to hydrolyze the above-mentioned silicon compound and (3) adding a curing catalyst, which promotes the condensation of silanol groups, is coated onto a resin base material and reacted and cured at room temperature or within a range of room temperature to 'a temperature at which the base material will not be damaged' (the deformation temperature or less in the case of a thermoplastic resin or the decomposition temperature or less in the case of a hardening resin) to form a low reflection layer, containing silica microparticles and a binder at a solids weight ratio of 30:70 to 95:5.

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Patent Owner(s)

Patent OwnerAddress
SDC TECHNOLOGIES-ASIA LTDICHIHARA-SHI CHIBA 299-0107

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Takahashi, Koji Chiba, JP 628 8760

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