Method for producing article having been subjected to low reflection treatment, solution for forming low reflection layer and article having been subjected to low reflection treatment
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United States of America Patent
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N/A
Issued Date -
Sep 14, 2006
app pub date -
Feb 6, 2004
filing date -
Feb 6, 2003
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A low reflection treated article manufacturing method wherein a low reflection layer solution, obtained by mixing and reacting (1) silica microparticles, comprising at least one type of silica microparticles selected from the group consisting of non-aggregated silica microparticles with an average particle diameter of 40 to 1000 nm, hollow non-aggregated silica microparticles with an average particle diameter of 10 to 100 nm, and chain-like aggregated silica microparticles with an average primary particle diameter of 10 to 100 nm, (2) a hydrolyzable silicon compound, water, and a binder solution, containing a solvent and a hydrolysis catalyst for the above-mentioned silicon compound, to hydrolyze the above-mentioned silicon compound and (3) adding a curing catalyst, which promotes the condensation of silanol groups, is coated onto a resin base material and reacted and cured at room temperature or within a range of room temperature to 'a temperature at which the base material will not be damaged' (the deformation temperature or less in the case of a thermoplastic resin or the decomposition temperature or less in the case of a hardening resin) to form a low reflection layer, containing silica microparticles and a binder at a solids weight ratio of 30:70 to 95:5.

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- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
---|---|---|
SDC TECHNOLOGIES-ASIA LTD | ICHIHARA-SHI CHIBA 299-0107 |
International Classification(s)

- [Classification Symbol]
- [Patents Count]
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Takahashi, Koji | Chiba, JP | 628 | 8760 |
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Maintenance Fees
Fee | Large entity fee | small entity fee | micro entity fee | due date |
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Fee | Large entity fee | small entity fee | micro entity fee |
---|---|---|---|
Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
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