Optical metrology method which is used to determine the three-dimensional topography of a hole
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United States of America Patent
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N/A
Issued Date -
Aug 31, 2006
app pub date -
Oct 8, 2004
filing date -
Oct 10, 2003
priority date (Note) -
Abandoned
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Abstract
The invention relates to a method for the optical metrology of conical holes. The inventive method consists in: placing the body comprising the hole in a microscope such that the larger-diametered area of the hole is directed towards lighting means, centring the hole in the field of vision of the observation means, focusing on the smaller-diametered area with the aid of an intense light, and measuring the diameter thereof and the main defects in same. The focusing plane is then changed and the contour of the hole is measured by projecting a series of patterns and measuring the position of points along the contour when the images of the projected pattern and the reflection thereof inside the hole are superimposed in the plane of a camera belonging to the equipment. The method is repeated and the information relating to the contours measured in different planes is processed in order to obtain a three-dimensional geometric representation and the characteristic parameters of the topography of the interior of the hole.
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