Use of an oxidizer to improve trace metals removal from photoresist and photoresist components
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United States of America Patent
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app pub date -
Feb 9, 2006
filing date -
Aug 8, 2002
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Abstract
A process of removing trace levels of metallic impurities from resist or photoresist component solutions and obtaining a purer resist or resist component solution without isolating the resist or resist component as a solid by treating the resist or resist component solution with an aqueous solution of a water soluble oxidizer, such as hydrogen peroxide, then with an acidic aqueous solution, and then allowing organic and aqueous phases to form with said aqueous phase containing metallic impurities extracted from said organic phase and the organic phase containing said resist or resist component solution with reduced amount of trace metal impurities, and separating the two phases.
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