Method of CVD chamber cleaning
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United States of America Patent
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Issued Date -
Jul 13, 2006
app pub date -
Dec 22, 2004
filing date -
Dec 22, 2004
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Abstract
A method for cleaning a plasma CVD reactor includes, during a cleaning cycle, (i) providing cleaning active species derived from a cleaning gas in the plasma CVD reactor, and (ii) generating a hydrogen plasma in an interior of the plasma CVD reactor to clean the interior of the reactor.
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