Method for determining the focal position of a laser beam
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United States of America Patent
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Issued Date -
Jun 29, 2006
app pub date -
May 30, 2003
filing date -
Nov 28, 2002
priority date (Note) -
Abandoned
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Abstract
Disclosed is a method for determining the focal position of a laser beam, according to which a plurality of linear patterns are first created on the surface of a sample substrate by the laser beam, the distance between the laser and the substrate surface being gradually modified. The width of the individual lines is then measured and the line having the smallest width is determined. The vertical setting associated with the smallest line width is evaluated and stored as the focal setting of the machine.
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