Photomask and method for maintaining optical properties of the same

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United States of America Patent

SERIAL NO

11349438

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Abstract

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A photomask and method for maintaining optical properties of the same are disclosed. The method includes providing a substrate including a first surface having an absorber layer formed thereon and a second surface located opposite the first surface. A pattern is formed in the absorber layer to create a photomask for use in a semiconductor manufacturing process. A transmissive protective layer is also formed on at least one of the patterned layer and the second surface of the substrate. The protective layer reduces haze growth when the photomask is used in the semiconductor manufacturing process.

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Patent Owner(s)

Patent OwnerAddress
TOPPAN PHOTOMASKS INC131 OLD SETTLERS BOULEVARD ROUND ROCK TX 78664

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chovino, Christian Round Rock, TX 4 12
Dieu, Laurent Austin, TX 10 345
Gordon, Joseph Stephen Gardiner, NY 5 52
Johnstone, Eric Vincent Round Rock, TX 1 6

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