Dressing method for polishing pad
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United States of America Patent
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Issued Date -
Jun 8, 2006
app pub date -
Aug 3, 2005
filing date -
Dec 3, 2004
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
The present invention provides a dressing method for a polishing pad in a polishing apparatus which performs work with a work piece contacting a polishing pad while supplying a slurry, comprising the steps of performing dressing of the polishing pad by pressing a pad dresser against the polishing pad and performing dressing of the polishing pad by making a cleaning fluid fog drops each with a droplet grain size of 1 .mu.m to 500 .mu.m inclusive and spouting the fog drops to the polishing pad from a nozzle at a speed of 10 m/second to 500 m/second inclusive.
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